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韓國(guó)食品級(jí)測(cè)試KFDA檢測(cè)機(jī)構(gòu)-第三方KFDA測(cè)試公司
        

        

        

        

        

        

        

        

        

        

        

        

        


        

        
單價(jià)：
面議

        

        
發(fā)貨期限：
自買家付款之日起   天內(nèi)發(fā)貨

        

        
所在地：
廣東 東莞

        

        
有效期至：
長(zhǎng)期有效

        

        
發(fā)布時(shí)間：
2023-12-15 13:56

        

        
最后更新：
2024-10-24 14:06

        

        
瀏覽次數(shù)：
290

        

        
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        發(fā)布企業(yè)資料
        

        

        

        

        

        

        

        

        詳細(xì)說(shuō)明
        

        韓國(guó)食品級(jí)測(cè)試KFDA（?? ?? ??? ?? ??）
        專業(yè)提供各類出往韓國(guó)市場(chǎng)的食品接觸類材料的KFDA檢測(cè)、KFDA測(cè)試一站式專業(yè)辦理，
        常見的KFDA測(cè)試材料和測(cè)試項(xiàng)目如下：
        KFDA 韓國(guó)
        Material
        Test Item
        合成樹脂Synthetic Resin
         (general standard)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        (except for PF, UF, MF, POM)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        PVC
        聚氯乙烯
        Dibutyltin
        Vinylchloride Monomer(VCM)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        phthalates(DBP,BBP,DEHP,DnOP,DINP,DIDP,DEHA)
        (in water, 4% acetic acid, 20% ethanol and n-heptane)
        Cresylphosphoric ester
        PP,EVA, PPS,
        PMP(polymethylpentene), PVA(Polyvinyl Alcohol),
        PB-1(Polybutene-1), Polyimide(PI),
         Hydroxybutyl(HBP), Fluoro Resins(FR), Ionomer resin, Polyethylene naphthalate(PEN), Ethylene Vinyl Polyetheretherketone(PEEK),
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        PS 聚苯乙烯
        Polyphenylene ether
        (PPE),聚亞苯基氧化 物樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate (Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Volatile matter
        PVDC
        聚偏二氯乙烯包裝材料
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Barium
        Vinylidene chloride
        PET
        滌綸樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Soluble Antimony in 4% acetic acid(Elution)
        Soluble Germanium in 4% acetic acid(Elution)
        Terephthalic acid (elution)
        Isophthalic acid(Elution)
        PF(Phenol formaldehyde)
        苯酚甲醛醛樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Phenol(Elution-4% acetic acid)
        Formaldehyde(Elution-4% acetic acid)
        MF (melamine
        formaldehyde)
         三聚氰胺甲醛樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Phenol(Elution-4% acetic acid)
        Formaldehyde(Elution-4% acetic acid)
        melamine(Elution-4% acetic acid)
        UF (ureaformaldehyde)
        尿醛樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Phenol(Elution-4% acetic acid)
        Formaldehyde(Elution-4% acetic acid)
        Acrylic resin
        丙烯酸樹脂
        亞克力樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Methylmethacrylate(Elution-20% ethanol) (contains over 50% methylmethacrylate)
        PA
        尼龍
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        4,4'-methylenedianiline(Elution-4% acetic acid)
        Ethylenediamine(Elution)
        Hexamethylenediamine(Elution)
        Caprolactam(Elution-20% ethanol)
        PC 聚碳酸酯
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        BPA(include phenol, BPA,pt-butylphenol)
        Bisphenol A(Elution-include phenol, BPA,pt-butylphenol))
        Diphenylcarbonate
        Amines(Triethylamine and tributylamine)
        PU 聚胺酯樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        4,4'-methylenedianiline( acetic acid)
        isocyanate(in water, 4% acetic acid, 20% ethanol and n-heptane)
        ABS, AS丙烯腈共聚物
             苯乙烯共聚物
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Volatile matter
        1,3-butadiene
        Acrylonitrile(Elution-water)(
        (MS)Polymethacrylstyrene
        聚苯乙烯
        Volatile matter
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Methylmethacrylate(Elution-20% ethanol)
        PAN平底鍋，盤子
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Acrylonitrile(Elution-water)
        MABS ABS添加PMMA共合
          成的透明級(jí)的ABS
        Volatile matter
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        1,3-butadiene
        Acrylonitrile(Elution-water)
        Methylmethacrylate(Elution-20% ethanol)
        4,4'-methylenedianiline( acetic acid)
        Epoxy resin
        環(huán)氧樹脂
        BPA(Elution-include phenol, BPA,pt-butylphenol))
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        BPA diglycidyl ether(elution)
        BPA F diglycidyl ether(elution)
        Epichlorohydrin(elution-n-heptane)
        Amines
        聚酯PCT
        Terephthalic acid (elution)
        Isophthalic acid(Elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Antimony in 4% acetic acid
        PE
        聚乙烯
        1- hexane(elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        1-octene(elution)
        Polyarylsulfone
        (PASF)
        聚芳砜
        Bisphenol A(Elution-include phenol, BPA,pt-butylphenol)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        4,4'-dichlorodiphenyl sulfone(Elution)
        PES
        聚醚砜樹脂
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        4,4'-dichlorodiphenyl sulfone(Elution)
        POM
         聚甲醛
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Formaldehyde(Elution-4% acetic acid)
        聚酯PBT
        Terephthalic acid (elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Isophthalic acid(Elution)
        PAR
        聚芳酯
        Terephthalic acid (elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Isophthalic acid(Elution)
        聚酯 PLA/PBSA
        As(elution）
        formaldehyde in 4% acetic acid (elution)
        flurescent matter
        PMP
        polymethylpentene
        聚甲基戊烯
        4-methyl-1-pentene (elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        PPS
        (poly(phenylenesufide)
        聚苯硫醚
        1,4-dichlorobenzene(elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Crosses-linked  
        polyester resin
        聚脂樹脂
        Terephthalic acid (elution)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        Heavy metal as lead(Elution)
        Consumption of Potassium Permanganate(Elution)
        Evaporation Residues (water)
        Evaporation Residues (4% acetic acid)
        Evaporation Residues (20% ethanol)
        Evaporation Residues (n-heptane)
        Isophthalic acid(Elution)
        玻璃紙 cellophane
        ( regenerated cellulose film)
        As in 4% acetic acid (elution)
        total Pb
        total Cd
        total Hg
        total Cr(VI)
        Heavy metal as lead (Elution)
        Evaporation Residues (4% acetic acid)
        Rubber,silicone resin,
        BDR(Butadiene resins), TPE
        橡膠，彈性體
        2-mercaptoimidazoline
        Total lead
        Total cadmium
        Heavy metal as lead in 4% acetic acid
        Evaporation Residues (water, 20% ethanol for oil food)
        Evaporation Residues (water)----for rubber pacifiers
        Phenol in 4% acetic acid(Elution)
        Formaldehyde in 4% acetic acid (Elution)
        Zinc in 4% acetic acid (elution)
        Zinc in water(elution)
        Nitrosamine and nitrosatable substances (only for rubber nipple)
        紙制品
        Paper /processed paper
        PCBs(AC 1221, AC1232, AC 1242, AC1248, AC1254, AC1260)
        Total lead
        Total Cadmium
        Total Mercury
        Total Chromium(VI)
        As in  4% acetic acid (elution)
        Heavy metal as lead in 4% acetic acid (Elution)
        Evaporation Residues
        Formaldehyde in water (Elution)
        flurescent matter
        metal containers,  
        packages
        and apparatus
          金屬容器/包裝/設(shè)備
        Pb, Cd,Ni in water( food pH >5)or 0.5% citric acid(food pH5)or 0.5% citric acid(food pH
        
  
 
        

        
 

        

        

         

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